Hey!!! "Hands on Training" is for those who have attended the INUP Familiarization Workshop (but not compulsory) in the past either at IISc Bangalore or IIT Guwahati (Special event on 28-29 Sept 2012

Hands on Training: 15-23 September 2016

Last date of receipt of Application: 20 August 2016

Selection Criteria

Young faculty members and scholars registered for PhD with research interest on related areas will be given the highest priority for selection.

Undergraduate and master levels course students are normally not selected for this program.

Research scientists from national research centers and Scientists from private industries are welcome to attend this program at payment basis only.

However, they will not be eligible for any travel support.



Training Modules:

1. Hands on Training on MEMS/NEMS Fabrication Technologies.

Contents - Selection of Silicon Wafer, RCA cleaning, Pyrogenic/Wet oxidation,Photolithography (Dehydration, Photoresist resist coating, Aligning and Exposing, Developing), Oxide etching,Wet etching, Cantilever device release using Reactive Ion Etching, Microscope inspection, Characterization of the devices using Scanning Electron Microscopy (SEM) and Laser Doppler vibrometry (LDV).

2. Hands on Training on Nanoelectronics Fabrication.

Contents - Fabrication and Electrical Characterization of MOS Capacitor

3. Hands on Training on Photovoltaics.

Contents - Selection of Silicon Wafer, RCA cleaning Pyrogenic/WET oxidation, lithography (Dehydration, Photoresist coating, Aligning and Exposing, Developing), oxide etching using Reactive Ion Etching, deposition and diffusion, Contact lithography, Front Metallization (Sputtering or e-beam Evaporation), Lift-off, lithography (front side pattern protection), oxide etching on the back side, Backside metallization(Sputtering or e-beam Evaporation), Forming Gas Annealing, characterization of the fabricated devices by in an IV probe station and a solar simulator.

4. Hands on Training on Bio Sensors/PDMS Channel.

Contents - a.Growth of oxide layer on Silicon, b.Characterization of oxide thickness with ellipsometry, c.Lithography to define array, d.Measurement of diffraction signals.

Address:
Indian Institute of Science  
C V Raman Ave, Bengaluru, Karnataka 560012